Azimuthal scanning of a structure formed on a semiconductor wafer
Number of patents in Portfolio can not be more than 2000
United States of America Patent
Stats
-
May 29, 2007
Grant Date -
Apr 28, 2005
app pub date -
Oct 28, 2003
filing date -
Oct 28, 2003
priority date (Note) -
In Force
status (Latency Note)
Importance
Abstract
A structure formed on a semiconductor wafer is examined by directing an incident beam at the structure at an incidence angle and a azimuth angle. The incident beam is scanned over a range of azimuth angles to obtain an azimuthal scan. The cross polarization components of diffracted beams are measured during the azimuthal scan.
First Claim
Family
International Classification(s)
Cited Art Landscape
Patent Citation Ranking
Advertisement
Advertisement
Advertisement
Recipient Email Address
Recipient Email Address
Comment
Recipient Email Address
Add to Portfolio(s)
To add this patent to one, or more, of your portfolios, simply click the add button.
This Patent is in these Portfolios:
Add to additional portfolios:
Last Refreshed On:
Changes done successfully