Fluorescent X-ray analysis apparatus

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United States of America Patent

PATENT NO 7634053
APP PUB NO 20070211852A1
SERIAL NO

11708789

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Abstract

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There is provided a fluorescent X-ray analysis apparatus in which a detection lower limit is improved, and it is possible to quantify a trace aimed element having been contained not only in a sample whose main component is a heavy element but also in a sample whose main component is a light element. The fluorescent X-ray analysis apparatus possesses a sample base supporting the sample, an X-ray source irradiating a primary X-ray with a predetermined irradiation position being made a center, and a detector disposed toward the irradiation position and detecting a fluorescent X-ray generated from the sample. The sample base has a detachable sample holding tool fixing the sample while being approached to the X-ray source and the detector, and a measurement is possible by selectively disposing the sample in any one of a 1st inspection position in which an irradiated face is coincided with the irradiation position, or a 2nd inspection position in which the sample is fixed to the sample holding tool, an irradiated face is approached to the X-ray source, and an inspected face is approached to the detector.

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Patent Owner(s)

  • HITACHI HIGH-TECH SCIENCE CORPORATION

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Inventor(s)

Inventor Name Address # of filed Patents Total Citations
Matoba, Yoshiki Chiba , JP 34 204

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