Environmental system including a transport region for an immersion lithography apparatus
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United States of America Patent
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Jun 28, 2011
Grant Date -
Feb 7, 2008
app pub date -
Jun 28, 2007
filing date -
Apr 10, 2003
priority date (Note) -
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Abstract
A lithographic projection apparatus that is arranged to project a pattern from a patterning device onto a substrate using a projection system has a liquid supply system arranged to supply a liquid to a space between the projection system and the substrate. The apparatus also includes a liquid collecting system that includes a liquid collection member having a wick structure member through which a liquid is collected from a surface of an object opposite to the liquid collection member.
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