Radiation-sensitive resin composition, onium salt compound and method for forming resist pattern

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United States of America

PATENT NO 11281100
APP PUB NO 20190285983A1
SERIAL NO

16424986

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Abstract

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A radiation-sensitive resin composition includes a resin including a structural unit having an acid-dissociable group, an onium salt compound represented by formula (1), and a solvent.

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Patent Owner(s)

  • JSR CORPORATION

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Inventor(s)

Inventor Name Address # of filed Patents Total Citations
Nishikori, Katsuaki Tokyo, JP 24 6

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