Using time and/or power modulation to achieve dose gray-scale in optical maskless lithography
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United States of America Patent
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Dec 9, 2008
Grant Date -
Jun 1, 2006
app pub date -
Jan 10, 2006
filing date -
Jul 31, 2003
priority date (Note) -
In Force
status (Latency Note)
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Abstract
In lithography applications, it is desirable to control, for example, a position or width of a printed line. An effective method of controlling these patterns and their resolution is by having as many grayscale levels as possible. The present invention comprises methods of grayscaling wherein modulation of the exposure time increases the number of grayscale levels on an object. In addition, the present invention comprises methods of grayscaling wherein modulating the power of an exposure beam provides additional grayscale levels.
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