Method for analyzing gait pattern
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United States of America Patent
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Sep 11, 2012
Grant Date -
Jun 23, 2011
app pub date -
Dec 15, 2010
filing date -
Dec 22, 2009
priority date (Note) -
In Force
status (Latency Note)
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Abstract
A method for analyzing a gait pattern includes: measuring, by a plurality of force sensing resistor (FSR) sensors, foot pressure values, and outputting the measured foot pressure values, respectively; searching for a maximum pressure local area in which the sum of the output values from the FSR sensors included in each of a plurality of pressure local areas is maximized; calculating a center of pressure (COP) with respect to the detected maximum pressure local area; and analyzing a gait pattern by adding the calculated COP to the trajectory of COPs.
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