Optical measurement method and system and optical device manufacturing system
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United States of America Patent
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Dec 12, 2023
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N/A
app pub date -
Mar 21, 2019
filing date -
Dec 3, 2018
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Abstract
An optical measurement method and system and an optical device manufacturing system are provided. The optical measurement system includes an image generation system, an image measurement system and a control system. The image generation system is configured for generating test image information and outputting light containing the test image information to a device under test. The image measurement system is configured for obtaining detected image information according to the light passing through the device under test. The control system is configured for obtaining an aberration parameter according to imaging quality of the detected image information. The optical measurement method and system and an optical device manufacturing system can simulate any wavefront, and an assembled lens element can be simulated directly according to the compensation of an unassembled lens element to achieve a final imaging effect.
First Claim
Family
- 15 United States
- 10 France
- 8 Japan
- 7 China
- 5 Korea
- 2 Other
Patent Owner(s)
Patent Owner | Address | |
---|---|---|
JIANGSU INTELIGHT ELECTRONIC TECHNOLOGY CO LTD | 215512 ROOM 401 BUILDING 1 KECHUANGYUAN CHANGSHU ECONOMIC AND TECHNOLOGICAL DEVELOPMENT ZONE CHANGSHU CITY SUZHOU CITY JIANGSU PROVINCE SUZHOU CITY JIANGSU PROVINCE 215512 | |
SHANGHAI INTELIGHT ELECTRONIC TECHNOLOGY CO LTD | SHANGHAI 200438 |
International Classification(s)
Inventor(s)
Inventor Name | Address | # of filed Patents | Total Citations |
---|---|---|---|
Tan, Shunyi | Shanghai, CN | 4 | 5 |
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