Optical measurement method and system and optical device manufacturing system

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United States of America Patent

PATENT NO 11841288
SERIAL NO

17298662

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Abstract

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An optical measurement method and system and an optical device manufacturing system are provided. The optical measurement system includes an image generation system, an image measurement system and a control system. The image generation system is configured for generating test image information and outputting light containing the test image information to a device under test. The image measurement system is configured for obtaining detected image information according to the light passing through the device under test. The control system is configured for obtaining an aberration parameter according to imaging quality of the detected image information. The optical measurement method and system and an optical device manufacturing system can simulate any wavefront, and an assembled lens element can be simulated directly according to the compensation of an unassembled lens element to achieve a final imaging effect.

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Patent Owner(s)

Patent OwnerAddress
JIANGSU INTELIGHT ELECTRONIC TECHNOLOGY CO LTD215512 ROOM 401 BUILDING 1 KECHUANGYUAN CHANGSHU ECONOMIC AND TECHNOLOGICAL DEVELOPMENT ZONE CHANGSHU CITY SUZHOU CITY JIANGSU PROVINCE SUZHOU CITY JIANGSU PROVINCE 215512
SHANGHAI INTELIGHT ELECTRONIC TECHNOLOGY CO LTDSHANGHAI 200438

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Inventor(s)

Inventor Name Address # of filed Patents Total Citations
Tan, Shunyi Shanghai, CN 4 5

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