Surface treatment method for imparting alcohol repellency to semiconductor substrate

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United States of America Patent

PATENT NO 11174399
APP PUB NO 20200207993A1
SERIAL NO

16615920

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Abstract

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According to the present invention, a method for treating the surface of a semiconductor substrate can be provided, the method including bringing the semiconductor substrate into contact with a liquid composition to impart alcohol repellency to the semiconductor substrate, wherein the liquid composition is characterized by containing: 0.01 to 15% by mass of each of at least two compounds selected from surfactants respectively represented by formulae (1) to (6) and salts thereof; and water.

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Patent Owner(s)

  • MITSUBISHI GAS CHEMICAL COMPANY, INC.

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Inventor(s)

Inventor Name Address # of filed Patents Total Citations
Putra, Priangga Perdana Tokyo, JP 3 2
Shimada, Kenji Tokyo, JP 81 2280

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