Cleaning method, method of manufacturing semiconductor device, and substrate processing apparatus

Number of patents in Portfolio can not be more than 2000

United States of America

PATENT NO 11965240
APP PUB NO 20210277518A1
SERIAL NO

17191420

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ATTORNEY / AGENT: (SPONSORED)

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Abstract

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There is provided a technique that includes: removing a deposit that adheres to an interior of a process chamber by performing a cycle a predetermined number of times, the cycle including performing sequentially: (a) supplying a cleaning gas to the interior of the process chamber until an internal pressure of the process chamber rises to a first pressure range; (b) exhausting the interior of the process chamber and supplying the cleaning gas to the interior of the process chamber in parallel to maintain the internal pressure of the process chamber within the first pressure range; and (c) exhausting the interior of the process chamber until the internal pressure of the process chamber reaches a second pressure that is below the first pressure range.

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Patent Owner(s)

  • KOKUSAI ELECTRIC CORPORATION

International Classification(s)

Inventor(s)

Inventor Name Address # of filed Patents Total Citations
Nishida, Keigo Toyama, JP 19 48

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