Negative resist composition and pattern forming process

Number of patents in Portfolio can not be more than 2000

United States of America

PATENT NO 11994799
APP PUB NO 20230116747A1
SERIAL NO

17864748

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Abstract

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A negative resist composition is provided comprising a base polymer and an acid generator in the form of a sulfonium salt consisting of a sulfonate anion having a maleimide group and a cation having a polymerizable double bond. The resist composition adapted for organic solvent development exhibits a high resolution and improved LWR or CDU.

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Patent Owner(s)

  • SHIN-ETSU CHEMICAL CO. LTD.

International Classification(s)

Inventor(s)

Inventor Name Address # of filed Patents Total Citations
Hatakeyama, Jun Joetsu, JP 655 7307

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