Lithographic apparatus and device manufacturing method
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United States of America Patent
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Jun 28, 2011
Grant Date -
Oct 23, 2008
app pub date -
Apr 19, 2007
filing date -
Apr 19, 2007
priority date (Note) -
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Abstract
A lithographic apparatus includes an illumination system configured to condition a radiation beam; a support constructed to support a patterning device, the patterning device being capable of imparting the radiation beam with a pattern in its cross-section to form a patterned radiation beam; a substrate table constructed to hold a substrate; a projection system configured to project the patterned radiation beam onto a target portion of the substrate, and a shield device arranged between a source of air flows and/or pressure waves and an element sensitive for the air flows and/or pressure waves.
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