Optical masks and methods for measuring aberration of a beam
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United States of America Patent
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Sep 21, 2010
Grant Date -
May 6, 2010
app pub date -
Jan 12, 2010
filing date -
Dec 21, 2004
priority date (Note) -
Expired
status (Latency Note)
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Abstract
An optical mask for use with an exposure beam includes a mask substrate adapted to be placed on a traveling path of the exposure beam. A reference pattern is formed on the mask substrate. The reference pattern is adapted to direct the exposure beam to travel in a predetermined reference direction. A comparative pattern is formed on the mask substrate. The comparative pattern is adapted to direct the exposure beam to travel in a direction inclined at a predetermined angle with respect to the reference direction.
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