Method and apparatus for manufacturing film structure
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United States of America Patent
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Dec 6, 2022
Grant Date -
Sep 17, 2020
app pub date -
Feb 17, 2020
filing date -
Mar 11, 2019
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Abstract
A method for manufacturing a film structure includes: a positional deviation amount detection process of detecting an amount of positional deviation related to a relative position of a second cured film formed on a rear surface of a film with respect to a first cured film formed on a front surface of the film; a relative position adjustment process of correcting a position or a rotation speed of a second transfer roll to adjust the relative position such that the amount of positional deviation detected in the positional deviation amount detection process is reduced; a first tensile force detection process and a second tensile force detection process of respectively detecting a tensile force of the film between a first pressurizing roll and a second pressurizing roll before and after the relative position adjustment process; and a tensile force adjustment process of adjusting the tensile force of the film such that the tensile force of the film detected in the second tensile force detection process approaches the tensile force of the film detected in the first tensile force detection process.
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- 15 United States
- 10 France
- 8 Japan
- 7 China
- 5 Korea
- 2 Other
Patent Owner(s)
- PANASONIC INTELLECTUAL PROPERTY MANAGEMENT CO., LTD.
International Classification(s)
Inventor(s)
Inventor Name | Address | # of filed Patents | Total Citations |
---|---|---|---|
Kamatani, Junichi | Osaka, JP | 3 | 1 |
Kamikihara, Nobuyuki | Nara, JP | 12 | 76 |
Yamamoto, Yuji | Osaka, JP | 386 | 4436 |
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