Apparatus and methods for detecting overlay errors using scatterometry
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United States of America Patent
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Oct 9, 2007
Grant Date -
Dec 23, 2004
app pub date -
Feb 23, 2004
filing date -
Feb 22, 2003
priority date (Note) -
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status (Latency Note)
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Abstract
Disclosed is a method of determining an overlay error between two layers of a multiple layer sample. For each of a plurality of periodic targets that each have a first structure formed from a first layer and a second structure formed from a second layer of the sample, a first optical signal is measured using a first ellipsometer or a first reflectometer and a second optical signal is measured using a second ellipsometer or a second reflectometer. There are predefined offsets between the first and second structures. An overlay error is determined between the first and second structures by analyzing the measured first and second optical signals from the periodic targets using a scatterometry overlay technique based on the predefined offsets.
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