Electron source manufacturing method, and image forming apparatus method
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United States of America Patent
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Jul 9, 2002
Grant Date -
N/A
app pub date -
Sep 16, 1998
filing date -
Sep 16, 1997
priority date (Note) -
Expired
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Abstract
A method of manufacturing an electron source with electron emitting elements is provided. The method has a process of depositing a deposit substance in an area including at least an area of the electron emitting element from which area electrons are emitted. The depositing process is performed in an atmosphere of a gas containing at least a source material of the deposit substance, the gas having a mean free path allowing the gas to take a viscous flow state.
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