Utilities transfer system in a lithography system
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United States of America Patent
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May 20, 2008
Grant Date -
Nov 23, 2006
app pub date -
Jun 23, 2006
filing date -
Dec 12, 2003
priority date (Note) -
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Abstract
Techniques for transferring utilities to and from a reticle or wafer stage in a lithography system while minimizing physical disturbances that affect the stage are described. These techniques involve transferring utilities to and from the stage without making physical contact with the stage. Alternatively, utilities are transferred by making physical contact with the stage while the stage is in a stationary position. In addition to transferring utilities to and from the stage, devices such as processing devices, buffers (storage mediums), electrical components, and mechanical components can be placed within the stage to use and/or control the transferred utilities.
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