Antireflective coatings with increased etch rates
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United States of America Patent
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Feb 27, 2007
Grant Date -
Mar 7, 2002
app pub date -
Aug 17, 2001
filing date -
Aug 17, 2000
priority date (Note) -
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status (Latency Note)
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Abstract
The present invention provides new light absorbing compositions suitable for use as an antireflective coating ('ARC') with an overcoated resist layer. ARCs of the invention exhibit increased etch rates in standard plasma etchants. Preferred ARCs of invention have significantly increased oxygen content relative to prior compositions.
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