Dry dust removal method in organic chlorosilane production

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United States of America Patent

PATENT NO 8486171
APP PUB NO 20120285194A1
SERIAL NO

13381108

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Abstract

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Dry dust removal method in organic chlorosilane production is provided, in which the detailed steps are as follows: delivering high-temperature flue gas (a) from fluidized bed reactor (I) into inorganic film cross-flow filter (E) to remove dust for the first time; delivering the concentrated dust gas (c) trapped by inorganic film cross-flow filter (II) into bag filter (III) to remove dust for the second time; returning the gas mixture (f) of passing through bag filter (EI) to the air intake of inorganic film cross-flow filter (II); condensing the residual clean gas (b) from the osmotic side of inorganic film in condenser (A), and then rectifying in rectifying column (B) to separate the products of chloromethane (g) and methyl chlorosilane (h) to obtain the product of methyl chlorosilane (h); returning chloromethane to fluidized bed reactor to take part in reaction; retreating the dust (e) trapped by inorganic film cross-flow filter and bag filter, and then returning it to fluidized bed reactor (I) to take part in reaction.

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Patent Owner(s)

  • NANJING UNIVERSITY OF TECHNOLOGY;NANJING JIUSI HIGH-TECH CO., LTD.

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Inventor(s)

Inventor Name Address # of filed Patents Total Citations
Xing, Weihong Nanjing, CN 9 7
Xu, Nanping Nanjing, CN 8 8
Zhong, Zhaoxiang Nanjing, CN 6 4

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