Method for measuring the etching speed
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United States of America Patent
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Dec 7, 2004
Grant Date -
Jun 17, 2004
app pub date -
Apr 1, 2003
filing date -
Dec 17, 2002
priority date (Note) -
In Force
status (Latency Note)
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Abstract
The specification discloses a structure and method for measuring the etching speed. A test layer is connected with several resistors. Etching the metal layer disconnects in order the resistors from the circuit. The equivalent resistance of the sensing resistor system is measured to obtain the etching speed. In consideration of the errors of the resistors, the invention also provides a structure that utilizes an IC layout technique to put an interdigitized dummy resistor beside the sensing resistors. By taking the ratio of the equivalent resistance of the sensing resistors and the dummy resistor, the invention can compute to obtain the etching speed.
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