Adhesion of tungsten nitride films to a silicon surface

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Jun 23, 2009
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Dec 7, 2006
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May 4, 2006
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Jun 6, 2005

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layer by CVD. An additional metal layer (e.g., aluminum) may be formed over the tungsten layer.

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NOVELLUS SYSTEMS, INC.

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H01L:SEMICONDUCTOR DEVICES; ELECTRIC SOLID STATE DEVICE....

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Inventor Name	Address	# of filed Patents	Total Citations
Hausmann, Dennis	Los Gatos, US	31	4011
Nguyen, Huong T	San Ramon, US	6	31

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Adhesion of tungsten nitride films to a silicon surface

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United States of America Patent

11429567

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PATENT NO	7550851
APP PUB NO	20060273466A1
SERIAL NO	11429567
DOCKET NO

US Family Size	Non-US Coverage
Patent Longevity	Forward Citations

DATE PUBLISHED	PUBLICATION/PATENT NO.	PUBLICATION TYPE
June 23, 2009	US,7550851,B2 US7550851B2	GRANTED PATENT AS SECOND PUBLICATION
December 07, 2006	US,20060273466,A1 US20060273466A1	FIRST PUBLISHED PATENT APPLICATION

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11429567

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