Patterned wafer inspection using spatial filtering
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United States of America Patent
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Feb 3, 2004
Grant Date -
Jul 17, 2003
app pub date -
Jan 15, 2002
filing date -
Jan 15, 2002
priority date (Note) -
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status (Latency Note)
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Abstract
Apparatus for spatial filtering includes a Fourier lens, adapted to collect radiation emitted from a point and to separate the collected radiation into spatial components in a Fourier plane of the lens, and a programmable spatial filter, positioned at the Fourier plane. An image sensor is optically coupled to capture an image of the spatial components of the collected radiation in the Fourier plane, while the components are incident on the filter. A filter controller is coupled to receive and analyze the image captured by the image sensor and, responsive thereto, to control the spatial filter so as to block one or more of the spatial components.
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