Sulfonamide compound, polymer compound, resist material and pattern formation method
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United States of America Patent
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Aug 19, 2008
Grant Date -
May 3, 2007
app pub date -
Dec 20, 2006
filing date -
Sep 3, 2003
priority date (Note) -
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Abstract
A base polymer of a resist material includes a unit represented by a general formula of the following Chemical Formula 3: ##STR00001## wherein R.sup.1, R.sup.2 and R.sup.3 are the same or different and are a hydrogen atom, a fluorine atom, a straight-chain alkyl group, a branched or cyclic alkyl group or a fluoridated alkyl group with a carbon number not less than 1 and not more than 20; R.sup.4 is a straight-chain alkylene group or a branched or cyclic alkylene group with a carbon number not less than 0 and not more than 20; and R.sup.5 and R.sup.6 are the same or different and are a hydrogen atom, a straight-chain alkyl group, a branched or cyclic alkyl group, a fluoridated alkyl group with a carbon number not less than 1 and not more than 20, or a protecting group released by an acid.
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