Photodefined aperture plate and method for producing the same

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United States of America Patent

PATENT NO 11905615
APP PUB NO 20230080331A1
SERIAL NO

17808432

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ATTORNEY / AGENT: (SPONSORED)

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Abstract

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In one embodiment, a method for manufacturing an aperture plate includes depositing a releasable seed layer above a substrate, applying a first patterned photolithography mask above the releasable seed layer, the first patterned photolithography mask having a negative pattern to a desired aperture pattern, electroplating a first material above the exposed portions of the releasable seed layer and defined by the first mask, applying a second photolithography mask above the first material, the second photolithography mask having a negative pattern to a first cavity, electroplating a second material above the exposed portions of the first material and defined by the second mask, removing both masks, and etching the releasable seed layer to release the first material and the second material. The first and second material form an aperture plate for use in aerosolizing a liquid. Other aperture plates and methods of producing aperture plates are described according to other embodiments.

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Patent Owner(s)

Patent OwnerAddress
STAMFORD DEVICES LIMITEDGALWAY BUSINESS PARK DANGAN GALWAY

International Classification(s)

Inventor(s)

Inventor Name Address # of filed Patents Total Citations
Xu, Hong San Carlos, US 245 3525

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