Nanosheet semiconductor device and method for manufacturing the same

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United States of America Patent

PATENT NO 11942550
APP PUB NO 20220271171A1
SERIAL NO

17184245

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Abstract

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A method for manufacturing a nanosheet semiconductor device includes forming a poly gate on a nanosheet stack which includes at least one first nanosheet and at least one second nanosheet alternating with the at least one first nanosheet; recessing the nanosheet stack to form a source/drain recess proximate to the poly gate; forming an inner spacer laterally covering the at least one first nanosheet; and selectively etching the at least one second nanosheet.

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Patent Owner(s)

  • TAIWAN SEMICONDUCTOR MANUFACTURING COMPANY, LTD.

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Inventor(s)

Inventor Name Address # of filed Patents Total Citations
Chang, Chih-Chiang Hsinchu, TW 239 1383
Hsu, Chih Teng Hsinchu, TW 1 0
Kuo, Chien-I Hsinchu, TW 48 252
Lee, Chien-Wei Hsinchu, TW 50 70
Li, Chii-Horng Hsinchu, TW 154 848
Lin, Yan-Ting Hsinchu, TW 29 290
Su, Chien-Chang Hsinchu, TW 54 2001
Yan, Bang-Ting Hsinchu, TW 4 2
Yeo, Yee-Chia Hsinchu, TW 428 6714

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