Exposure apparatus and method
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United States of America Patent
Stats
-
Feb 13, 2007
Grant Date -
Nov 25, 2004
app pub date -
Jun 30, 2004
filing date -
Nov 28, 1996
priority date (Note) -
Expired
status (Latency Note)
Importance
Abstract
A scanning exposure apparatus includes a projection system, a stage system, a first detector and a control system. The stage system has first and second stages, each of which is movable independently in a plane while holding a substrate. The first detector detects focusing information of a vicinity of an outer circumference of the substrate during a detecting operation. The control system controls the stage system to perform the detecting operation with the first stage, while performing a first exposure operation on the substrate held by the second stage. After the first exposure operation, a second exposure operation for the substrate held on the first stage is performed, in which a shot area in the vicinity of the outer circumference of the substrate is exposed by moving the first stage while adjusting a position of the substrate surface held by the first stage using the detected focusing information.
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