Device for introducing reagents into an organometallic vapor phase deposition apparatus
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United States of America Patent
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Jul 6, 1993
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N/A
app pub date -
Mar 25, 1992
filing date -
Jun 4, 1991
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Abstract
The device for introducing reagents into an organometallic vapor phase deposition apparatus consists of a valve body having two chambers, each of which can be placed in communication with a passage for the introduction of the reagent and is permanently connected with two passages traversed by carrier gas.
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