Narrow band excimer or molecular fluorine laser with improved beam parameters
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United States of America Patent
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Aug 5, 2003
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N/A
app pub date -
Jul 5, 2001
filing date -
Jul 5, 2000
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Expired
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Abstract
An excimer or molecular fluorine laser system includes a discharge chamber filled with a gas mixture including a halogen-containing molecular species and at least one noble gas including a buffer gas, multiple electrodes within the discharge chamber and connected to a pulsed power supply circuit for energizing the gas mixture, and a resonator for generating an output beam. The resonator includes the discharge chamber and one or more optics for narrowing a bandwidth of the beam and for magnifying the beam in each of orthogonal beam axis directions for suppressing fluctuations in one or more output beam parameters.
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