Photosensitive paste and process for production of pattern using the same
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United States of America Patent
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Feb 15, 2011
Grant Date -
Jun 24, 2010
app pub date -
Dec 23, 2008
filing date -
Dec 23, 2008
priority date (Note) -
In Force
status (Latency Note)
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Abstract
Disclosed is a photosensitive paste comprising a polymerizable monomer and a photopolymerization initiator, wherein the glass transition temperature of the polymerizable monomer is −10° C. or less. The present paste may be used for creating a fine pattern and prevents residue from remaining in the area where paste should be removed.
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