Lithographic apparatus, radiation supply and device manufacturing method
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United States of America Patent
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Jun 1, 2010
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app pub date -
Mar 21, 2006
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Mar 21, 2006
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Abstract
A system for controlling the radiation dose in a pulse of radiation having a relatively large dose, in which a pulsed beam of radiation is divided into a plurality of pulsed sub-beams of radiation and the radiation dose of the pulses is adjusted after the radiation beam has been divided.
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