Microelectronic substrate including embedded components and spacer layer and method of forming same

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United States of America Patent

PATENT NO 7808797
SERIAL NO

11609297

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ATTORNEY / AGENT: (SPONSORED)

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Abstract

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A microelectronic substrate, a method of forming the same, and a system including the same. The microelectronic substrate comprises: a conductive layer; a spacer layer disposed onto the conductive dielectric layer; a dielectric build-up layer disposed onto the spacer layer, the spacer layer being made of a material that has a lower shrinkage than a material of the embedding dielectric-build-up layer during curing, and a higher viscosity than a material of the embedding dielectric build-up layer in its pre-cure form and during curing; and active or passive microelectronic components embedded within the dielectric build-up layer.

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Patent Owner(s)

  • INTEL CORPORATION

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Inventor(s)

Inventor Name Address # of filed Patents Total Citations
Salama, Islam Chandler, US 27 267
Seh, Huankiat Phoenix, US 13 91

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