Laser irradiation method that includes moving a center of rotation along a straight line in order to enhance the crystallinity of the semiconductor film
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United States of America
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Jul 10, 2007
Issued Date -
N/A
app pub date -
Sep 9, 2002
filing date -
Sep 9, 2002
priority date (Note) -
Withdrawn
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Abstract
Continuous wave laser apparatus with enhanced processing efficiency is provided as well as a method of manufacturing a semiconductor device using the laser apparatus. The laser apparatus has: a laser oscillator; a unit for rotating a process object; a unit for moving the center of the rotation along a straight line; and an optical system for processing laser light that is outputted from the laser oscillator to irradiate with the laser light a certain region within the moving range of the process object. The laser apparatus is characterized in that the certain region is on a line extended from the straight line and that the position at which the certain region overlaps the process object is moved by rotating the process object while moving the center of the rotation along the straight line.
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