Programmable method for cleaning semiconductor elements
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United States of America Patent
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Jan 26, 1999
Grant Date -
N/A
app pub date -
Dec 22, 1993
filing date -
Dec 22, 1993
priority date (Note) -
Expired
status (Latency Note)
Importance
Abstract
Method and apparatus for cleaning a workpiece such as a semiconductor element in which the element is placed on a chuck mounted on a rotation mechanism in which the rotation mechanism rotates around a first axis, and the element to be cleaned rotates around a second axis spaced from the first axis in a planetary manner. The cleaning process is programmed such that the element may be sprayed, immersed for a soak or pre-soak step, immersed while spinning, sprayed while spinning, and dried by heated gas, or any combination of these. The cleaning program is performed in a single chamber, which may be heated to a desired temperature.
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