Environmental system including vacuum scavenge for an immersion lithography apparatus
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United States of America Patent
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Apr 8, 2008
Grant Date -
Jun 1, 2006
app pub date -
Jan 11, 2006
filing date -
Apr 10, 2003
priority date (Note) -
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status (Latency Note)
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Abstract
An environmental system controls an environment in a gap between an optical assembly and a device and includes a fluid barrier and an immersion fluid system. The fluid barrier is positioned near the device. The immersion fluid system delivers an immersion fluid that fills the gap and collects the immersion fluid that is directly between the fluid barrier and the device. The fluid barrier can include a scavenge inlet that is positioned near the device, and the immersion fluid system can include a low pressure source that is in fluid communication with the scavenge inlet. The fluid barrier confines any vapor of the immersion fluid and prevents it from perturbing a measurement system. Additionally, the environmental system can include a bearing fluid source that directs a bearing fluid between the fluid barrier and the device to support the fluid barrier relative to the device.
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