Method and composition for improving LWR in patterning step using negative tone photoresist

Number of patents in Portfolio can not be more than 2000

United States of America Patent

PATENT NO 11187985
APP PUB NO 20190137880A1
SERIAL NO

16098794

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Abstract

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The present invention relates to a method of reducing the LWR (Line Width Roughness) of a photoresist pattern using a negative tone photoresist during the fabrication of a semiconductor, and more specifically to a composition capable of reducing LWR in order to ensure a higher pattern CDU after a negative tone development process, and a processing method using the composition, thus reducing the LWR, thereby providing better CDU than existing methods.

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Patent Owner(s)

  • YOUNG CHANG CHEMICAL CO., LTD

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Inventor(s)

Inventor Name Address # of filed Patents Total Citations
Kim, Gi Hong Daegu, KR 39 127
Lee, Seung Hun Daegu, KR 187 345
Lee, Seung Hyun Daegu, KR 172 828
Lee, Su Jin Daegu, KR 163 1090

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