Method for the manufacture of A.sub.3 B.sub.5 light-emitting diodes

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United States of America Patent

PATENT NO 4606780
SERIAL NO

06664148

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Abstract

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A method for the manufacture of A.sub.3 B.sub.5 light-emitting diodes, particularly of light-emitting (Ga,Al)As diodes with Te and Zn as doping materials is provided. A first n-doped GaAlAs layer is epitaxially applied on a GaAs substrate from an n-doped (S,Se,Te) Ga,Al,As melt and after an interim precipitation without contact with the GaAs substrate, preferably on an auxiliary substrate, a GaAlAs layer p-doped with Zn or Mg is deposited on the substrate already epitaxially coated with the n-GaAlAs layer. Efficient light-emitting diodes are obtained.

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Patent Owner(s)

  • SIEMENS AKTIENGESELLSCHAFT

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Inventor(s)

Inventor Name Address # of filed Patents Total Citations
Heindl, Christine Mantel, DE 3 12
Leibenzeder, Siegfried Erlangen, DE 4 20

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