Exposure apparatus, optical projection apparatus and a method for adjusting the optical projection apparatus
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United States of America Patent
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May 13, 2008
Grant Date -
Sep 20, 2007
app pub date -
May 4, 2007
filing date -
Jun 30, 1993
priority date (Note) -
Expired
status (Latency Note)
Importance
Abstract
An exposure apparatus includes a plurality of projection optical systems, each of which has optical elements arranged in an optical path between a first surface and a second surface and forms a radiation pattern from the first surface onto an exposure field on the second surface via the optical elements. The apparatus also includes a movable portion disposed in the side of the second surface with respect to the plurality of projection optical systems, which holds an object to be moved relative to the exposure field in a first direction during a scanning exposure of the object with the radiation patterns. Each of the plurality of projection optical systems is telecentric on the side of the second surface, and the exposure fields are arranged at different positions in a second direction crossing the first direction.
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