Spin coating method and coating apparatus
Number of patents in Portfolio can not be more than 2000
United States of America Patent
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Jul 15, 2003
Grant Date -
Mar 28, 2002
app pub date -
Mar 27, 2000
filing date -
Sep 27, 1997
priority date (Note) -
Expired
status (Latency Note)
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Abstract
There are provided a spin coating method and an apparatus for forming a thin film having a uniform thickness on a substrate at a low cost in a process for manufacturing semiconductors, optical disks and the like. A coating solution is dropped onto the surface of a substrate (2) to be coated, mounted on a horizontal turn table (3) through a discharge nozzle (4) and the substrate is turned to form a thin film. After the coating solution is dropped through the nozzle, a stand-by nozzle tip (4a) is soaked and held in a nozzle soaking solution (10) having a composition near or equivalent to that of the coating solution. The crystal deposition of the solute is suppressed. Inter alia, the present invention is useful when a solution containing a solute having high crystallizability is coated.
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