Gas field ionization ion source and ion beam device

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United States of America Patent

PATENT NO 8809801
APP PUB NO 20120199758A1
SERIAL NO

13501561

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Abstract

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Provided is a gas field ionization ion source capable of emitting heavy ions with high brightness which are suitable for processing a sample. The gas field ionization ion source according to the present invention includes a temperature controller individually controlling the temperature of the tip end of an emitter electrode (1) and the temperature of a gas injection port part (3) of a gas supply unit.

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Patent Owner(s)

  • HITACHI HIGH-TECHNOLOGIES CORPORATION

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Inventor(s)

Inventor Name Address # of filed Patents Total Citations
Ishitani, Tohru Sayama, JP 73 1437
Kawanami, Yoshimi Hitachinaka, JP 90 1031

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