SiC ingot processing method and laser processing apparatus

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United States of America Patent

PATENT NO 11958132
APP PUB NO 20210197319A1
SERIAL NO

17126395

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ATTORNEY / AGENT: (SPONSORED)

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Abstract

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A method of processing a SiC ingot includes a resistance value measuring step of measuring an electric resistance value of an end face of the SiC ingot, a laser beam output adjusting step of adjusting the output of a laser beam according to the electric resistance value measured in the resistance value measuring step, and a peeling belt forming step in which, while a laser beam of such a wavelength as to be transmitted through the SiC ingot is being applied to the SiC ingot with a focal point of the laser beam positioned at a depth corresponding to the thickness of a wafer to be formed, the SiC ingot and the focal point are put into relative processing feeding in an X-axis direction to form a belt-shaped peeling belt in the inside of the SiC ingot.

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Patent Owner(s)

  • DISCO CORPORATION

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Inventor(s)

Inventor Name Address # of filed Patents Total Citations
Hirata, Kazuya Tokyo, JP 109 764

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