Dielectric fin structure

Number of patents in Portfolio can not be more than 2000

United States of America Patent

PATENT NO 11404576
SERIAL NO

17069409

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Abstract

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A semiconductor device according to the present disclosure includes a dielectric fin having a helmet layer, a gate structure disposed over a first portion of the helmet layer and extending along a direction, and a dielectric layer adjacent the gate structure and disposed over a second portion of the helmet layer. A width of the first portion along the direction is greater than a width of the second portion along the direction.

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Patent Owner(s)

  • TAIWAN SEMICONDUCTOR MANUFACTURING COMPANY, LTD.

International Classification(s)

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Inventor(s)

Inventor Name Address # of filed Patents Total Citations
Chao, Kuo-Yi Hsinchu, TW 57 81
Hsieh, Wen-Hsing Hsinchu, TW 77 1027
Kuo, Jiun-Ming Taipei, TW 48 45
Lu, Yu-Shan Hsinchu County, TW 13 26
Peng, Yuan-Ching Hinchu, TW 60 260
Wang, Chih-Ching Kinmen County, TW 50 249
Yang, Chung-I Hsinchu, TW 10 1

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