Washing apparatus and washing method

Number of patents in Portfolio can not be more than 2000

United States of America Patent

PATENT NO 5934566
SERIAL NO

08908001

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ATTORNEY / AGENT: (SPONSORED)

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Abstract

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The present invention is directed to providing an apparatus which is improved so as to remove a contamination on a substrate efficiently. This apparatus includes a jet nozzle jetting out droplets toward a substrate. A liquid supply device and a gas supply device are connected to the jet nozzle. A mixing device mixing a liquid and a gas supplied to the jet nozzle and changing the liquid into the droplets is provided in the jet nozzle.

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Patent Owner(s)

  • RENESAS ELECTRONICS CORPORATION;RYODEN SEMICONDUCTOR SYSTEM ENGINEERING CORPORATION

International Classification(s)

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Inventor(s)

Inventor Name Address # of filed Patents Total Citations
Doi, Nobuaki Hyogo, JP 4 113
Kanno, Itaru Hyogo, JP 53 714
Ohmori, Toshiaki Hyogo, JP 20 482
Tanaka, Hiroshi Hyogo, JP 1050 11763

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