Apparatus and method for measuring an aerial image using transmitted light and reflected light

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United States of America Patent

PATENT NO 6184976
SERIAL NO

08948057

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ATTORNEY / AGENT: (SPONSORED)

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Abstract

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Apparatus and method for measuring an aerial image whereby influences of various defects existing on patterns formed on a photomask as well as the surface of the photomask substrate can be inspected. The aerial image measuring apparatus includes an optical transmitting device, an optical reflecting device and an aerial image forming device. The optical reflecting device includes a beam splitter and a reflecting mirror. The reflecting mirror switches the path of light so that the light transmitted along the reflected light path is irradiated to the surface of the photomask on which the patterns are formed. According to an aerial image measuring method of the present invention, either transmitted light or reflected light is selected for analysis, the selected light is converted into an electrical signal to form an aerial image, and the aerial image is measured.

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Patent Owner(s)

  • SAMSUNG ELECTRONICS CO., LTD.

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Inventor(s)

Inventor Name Address # of filed Patents Total Citations
Park, Jin-hong Seoul, KR 38 380
Yu, Young-hun Yongin, KR 2 50

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