Tetrahydrofuran compounds having alicyclic structure
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United States of America Patent
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Jan 21, 2003
Grant Date -
Dec 5, 2002
app pub date -
Apr 8, 2002
filing date -
Apr 9, 2001
priority date (Note) -
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Abstract
Tetrahydrofuran compounds of formula (1) wherein the broken line represents a single bond, a divalent organic group, or a structure in which the alicyclic structure in the form of norbornene or tetracyclo[4.4.0.1.sup.2,5.1.sup.7,10 ]dodecene and the tetrahydrofuran cyclic structure share one or two constituent carbon atoms, and k is 0 or 1 are novel and useful as monomers to form base resins for use in chemically amplified resist compositions adapted for micropatterning lithography ##STR1##
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