Method of treating a composite spin-on glass/anti-reflective material prior to cleaning
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United States of America Patent
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Jul 15, 2008
Grant Date -
Oct 5, 2006
app pub date -
Mar 30, 2005
filing date -
Mar 30, 2005
priority date (Note) -
Expired
status (Latency Note)
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Abstract
Methods are provided for cleaning a microelectronic device, and one method includes providing a substrate having a patterned SOG/anti-reflective material; performing a process to cure the patterned SOG/anti-reflective material; and performing a cleaning process to remove the cured SOG/anti-reflective material. An apparatus for cleaning a microelectronic device is provided that includes a processing chamber; means for performing a SOG/anti-reflective material curing process within the processing chamber, means for performing a cleaning process within the processing chamber and means for venting the processing chamber.
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