Photoresist composition with androstane and process for its use
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United States of America Patent
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Dec 3, 1996
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N/A
app pub date -
Jun 27, 1994
filing date -
Jun 27, 1994
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Abstract
The present invention relates to a radiation-sensitive resist composition comprising (a) a radiation-sensitive acid generator, (b) a substituted androstane, and (c) a copolymer binder. The copolymer binder comprises (meth)acrylic/(meth)acrylate copolymer.
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