Pattern drawing system having a processor for drawing the profile of the pattern and a processor for painting the drawn profile
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United States of America Patent
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May 12, 1992
Grant Date -
N/A
app pub date -
Jul 24, 1989
filing date -
Jul 27, 1988
priority date (Note) -
Expired
status (Latency Note)
Importance
Abstract
The pattern drawing system consists of a first data processor which develops the outline font data, calculates the coordinates of the points on the profile of a pattern and, according to the calculated profile coordinates, draws the profile of the pattern; and a second data processor which paints the interior of the profile drawn by the first data processor concurrently with the calculation of the profile coordinates by the first data processor. This configuration allows the first data processor to calculate the profile coordinates of a desired pattern while the second data processor is doing the painting. Such parallel operations improve the efficiency of the pattern drawing that uses the outline font data.
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Cited Art Landscape
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