TN-type array substrate and fabrication method thereof, and display device
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United States of America Patent
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Apr 11, 2017
Grant Date -
Jun 4, 2015
app pub date -
Apr 26, 2013
filing date -
Feb 6, 2013
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Abstract
A TN-type array substrate and a fabrication method thereof, and a display device, the fabrication method of the TN-type array substrate includes: a step of forming a first metal layer, a gate insulating layer, an active layer, a second metal layer and a transparent conductive layer on a substrate, wherein the first metal layer includes a gate electrode, the second metal layer includes a data line, the transparent conductive layer includes a pixel electrode; and wherein the forming the second metal layer and the transparent conductive layer includes: sequentially forming a transparent conductive thin film and a metal thin film on the substrate; performing one-off patterning process on the transparent conductive thin film and the metal thin film to form a thin film transistor (TFT) channel region, the transparent conductive layer and the second metal layer.
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