Sputtering apparatus and method of forming film

Number of patents in Portfolio can not be more than 2000

United States of America

PATENT NO 11230760
APP PUB NO 20210214841A1
SERIAL NO

15733976

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Abstract

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A sputtering apparatus SM has: a vacuum chamber in which a substrate and a target are disposed to lie opposite to each other; a plasma generating means generating a plasma inside the vacuum chamber; and a magnet unit disposed above the target. The magnet unit has a plurality of magnets with different polarities on a substrate side. A leakage magnetic field in which a line passing through a position where a vertical component of the magnetic field becomes zero is closed in an endless manner, is caused to locally act on such a space below the target as is positioned between the center of the target and a periphery thereof. The magnet unit is divided, on an imaginary line extending from the center of the target toward a periphery thereof, into a plurality of segments each having a plurality of magnets.

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Patent Owner(s)

  • ULVAC INC.

International Classification(s)

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Inventor(s)

Inventor Name Address # of filed Patents Total Citations
Fujii, Yoshinori Kanagawa, JP 47 511
Nakamura, Shinya Kanagawa, JP 162 1666

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