Exposing apparatus having substrate chuck of good flatness
Number of patents in Portfolio can not be more than 2000
United States of America Patent
Stats
-
Mar 29, 2011
Grant Date -
Jan 11, 2007
app pub date -
May 30, 2006
filing date -
May 30, 2005
priority date (Note) -
In Force
status (Latency Note)
Importance
Abstract
An exposing apparatus maintains uniformly a gap between a substrate and a mask stage. The substrate is disposed on a substrate chuck and the substrate chuck is supported by gap motors and air cylinders. The gap motors control the gap between the substrate and the mask stage and the air cylinders support the deflect portion of the substrate chuck to maintain the flatness of the whole area of the substrate.
First Claim
Family
International Classification(s)
Cited Art Landscape
Patent Citation Ranking
Advertisement
Advertisement
Advertisement
Recipient Email Address
Recipient Email Address
Comment
Recipient Email Address
Add to Portfolio(s)
To add this patent to one, or more, of your portfolios, simply click the add button.
This Patent is in these Portfolios:
Add to additional portfolios:
Last Refreshed On:
Changes done successfully