Compositions and methods for post-CMP cleaning of cobalt substrates

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United States of America Patent

PATENT NO 11845917
APP PUB NO 20200199500A1
SERIAL NO

16694426

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ATTORNEY / AGENT: (SPONSORED)

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Abstract

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A cleaning composition is disclosed for cleaning residue and/or contaminants from microelectronic devices having same thereon. The composition comprises at least one complexing agent, at least one cleaning additive, at least one pH adjusting agent, water, and at least one oxylamine compound. Advantageously, the compositions show effective cleaning of cobalt-containing substrates and improved cobalt compatibility.

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Patent Owner(s)

  • ENTEGRIS INC.

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Inventor(s)

Inventor Name Address # of filed Patents Total Citations
Frye, Donald Sherman, US 7 27
Liu, Jun Newtown, US 1408 16637
Thomas, Elizabeth New Milford, US 15 76
White, Daniela Ridgefield, US 60 368
White, Michael Ridgefield, US 210 6333

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